第二十一期至真讲坛

报告题目：

   1. Chemical Deposition of Ceramic Transparent Conducting Films

   2. Novel Applications of 2-Dimentional X-ray Detector to Thin Film Evaluation

报告时间：4月28日（周二）下午15:00

报告地点：邵科馆一楼圆廊会议室

报告人： 东京工艺大学超介质研究中心中心长 泽田丰（Yutaka SAWADA）教授、理学电机 星野、施劲

邀请人：功能材料所  车声雷 教授

泽田丰教授简介

Professor Yutaka Sawada, received his Ph.D degree in chemical engineering from Tokyo Institute of Technology in 1979. He worked at Toyota Central Research and Development Co. Ltd. His major research subject was sputtering deposition of indium-tin oxide transparent conducting films for automobile application. He moved to Tokyo Polytechnic University in 1986. He has been continuing chemical deposition (spray CVD and dip coating) of TCFs. He successfully fabricated low-resistivity ITO film by low-cost spray CVD in 2002 (9.5×10^-5 ohm.cm) and in 2003 (7.7×10^-5ohm.cm). He edited and coauthored some books on TCFs in Japanese.

Recent publications:

Characteristics of vanadium-doped indium oxide thin films for organic light-emitting diodes fabricated by spray chemical vapor deposition. Japanese Journal of Applied Physics 2015, 54, 041101 (http://dx.doi.org/10.67567/JJAP.54.041101).

Thermal crystallization kinetic and electrical properties of partly crystallized amorphous indium oxide thin films sputtering deposited in the presence or the absence of water vapor.  Journal of Thermal Analysis and Calorimetry, 2013, 111, 1457-1461.

Electrical properties of tin-doped indium oxide thin films prepared by a dip coating. Ceramics International, 2011, 288, S613-S616.

Fabrication of Organic Light-Emitting Devices with Indium-Tin-Oxide Anode  Prepared by Spray Chemical Vapor Deposition. Japanese Journal of Applied Physics 2010, 46, 6837-6841.

Good Conformability of Indium-Tin Oxide Thin Films Prepared by Spray Chemical Vapor Deposition. Eelctrochemical and Solid-State Letters, 2009 12 (5) D42-D44.

Deposition of undoped indium oxide thin films on stripe-patterned substrates by spray CVD. Journal of Crystal Growth 2009, 311, 642-646.

Thermal change of amorphous indium tin oxide films sputter-deposited in water vapor atmosphere. Thin Solid Films, 2008, 516, 5809-5813.

Major Publications:

（共著）透明導電膜の技術（改訂３版）2014/4/17 日本学術振興会透明酸化物光?電子材料第１６６委員会編　オーム社

（監修?共著）透明導電膜Ⅱ　（２００２年「透明導電膜の新展開Ⅱ」普及版）

2007/10 シーエムシ―出版

报告内容简述

Ceramic transparent conducting films are widely used for solar cells, low-energy lightings, flat panel displays such as liquid crystal devices and organic light-emitting diodes, touch-panels, transparent heaters etc. A typical TCF material is tin-doped indium Oxide (ITO, Indium-Tin-Oxide), which is generally manufactured by physical vapor deposition such as magnetron sputtering process. Low resistivity (7.7x10^-5 ohm cm) ITO films were fabricated by original inexpensive spray chemical vapor deposition. Nanostructures of the films will be demonstrated. ITO films deposited dip coating, will be introduced. Relation between conduction mechanism and nanostructure will be discussed. Aluminum or gallium-doped zinc oxide films deposited by chemical processes will be also introduced. Amorphous TCFs are usually prepared by PVD. A rare example of amorphous TCF prepared by chemical process is introduced: undoped tin oxide film prepared by spray CVD and its thermal crystallization will be demonstrated. Applications of TCFs for flexible and transparent organic light-emitting device (OLED) and 3-way (transparent, mirror and black) display device etc. will be introduced.