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第八期至真讲坛:东京工业大学篠崎和夫教授、樱井修准教授报告通知
作者:系统管理员 发布日期:2014-08-18 浏览次数:1269

第八期至真讲坛

 

报告题目:Synthesis of Oxide Thin Films and Their Applications

报告时间:825日下午2:30

报告地点:邵科馆一楼接待室

报告人: 东京工业大学 篠崎和夫教授,樱井修准教授

 

篠崎教授简介:

Prof.  Kazuo Shinozaki (篠崎和夫)

Dr. Kazuo Shinozaki is a professor of Tokyo Institute of Technology, Japan. His main research themes are oxide thin film, ceramic processing, nitride ceramics, and characterization of ceramics.

Professor Kazuo Shinozaki received a Doctor of Engineering in Materials Science in 1981 from Tokyo Institute of Technology, Japan. After holding a post-doctoral position at Tokyo Institute of Technology, he joined Toshiba Corp. from 1982 to 1986. In 1987, he engaged Department of Inorganic Materials in Tokyo Institute of Technology. He stayed in University of Washington from 1991 to 1992 as a Visiting Scholar.

Professor Kazuo Shinozaki received the 54th Award of the Ceramic Society of Japan as a title of "Development of the Electroceramics Through the Control of Liquid Phase" in 2000, The Best Paper Award in the Journal of the Ceramic Society of Japan in 2000, and Kiyoshi Okazaki Award, the highest award in ceramics research in Japan, in 2011.

 

报告内容简述:

Epitaxial Growth of Oxide Thin Films on Si and Oxide Substrates by Introducing Buffer Layers and Their ApplicationsEffect of Annealing Conditions and Substrates Kinds on Metal-Insulator Transition Temperature of La1-xSrxMnO3-δThin Films for Smart Radiation Devicesetc. 报告前将对东京工业大学材料大系(金属材料系、无机材料系、有机材料系三系联合)有一个简要的介绍。